Epitaxial Growth of MnSb Films Fabricated by Planar Sputtering: Effect of Substrate Temperature and Bias on Epitaxial Growth.
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چکیده
منابع مشابه
Epitaxial Growth of Rhenium with Sputtering †
We have grown epitaxial Rhenium (Re) (0001) films on α-Al2O3 (0001) substrates using sputter deposition in an ultra high vacuum system. We find that better epitaxy is achieved with DC rather than with RF sputtering. With DC sputtering, epitaxy is obtained with the substrate temperatures above 700 °C and deposition rates below 1 Å/s. The epitaxial Re films are typically composed of terraced hexa...
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ژورنال
عنوان ژورنال: Journal of the Magnetics Society of Japan
سال: 2000
ISSN: 0285-0192
DOI: 10.3379/jmsjmag.24.547